Ion beam processing for coating MgF_2 onto ambient temperature substrates
- 15 October 1984
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 23 (20) , 3608-3611
- https://doi.org/10.1364/ao.23.003608
Abstract
In this paper, we report on the use of inert gas ion bombardment during the deposition of MgF2 films on ambient temperature substrates. The low energy (<250-eV/ion) bombardment is shown to increase significantly the abrasion resistance and adherence of the films without significantly degrading their optical performance. The success of this technique has wide-ranging implications for the application of durable coatings to temperature sensitive substrates.Keywords
This publication has 13 references indexed in Scilit:
- Protective dielectric coatings produced by ion-assisted depositionApplied Optics, 1984
- Ion-assisted deposition of optical thin films: low energy vs high energy bombardmentApplied Optics, 1984
- Ion-beam-assisted deposition of thin filmsApplied Optics, 1983
- The effect of ion bombardment on stress and adhesion in thin films of silver and aluminumThin Solid Films, 1981
- Formation of transparent heat mirrors by ion plating onto ambient temperature substratesThin Solid Films, 1979
- Some trends in preparing film structures by ion beam methodsThin Solid Films, 1978
- Plasma polymerized coating for polycarbonate: single layer, abrasion resistant, and antireflectionApplied Optics, 1977
- Antireflection coating prepared by plasma polymerization of perfluorobutene-2Applied Optics, 1976
- Interface Formation during Thin Film DepositionJournal of Applied Physics, 1963