Functionalized polymers for high-resolution photolithography

• 1 January 1994
• journal article
• research article
• Published by Wiley in Polymers for Advanced Technologies
• Vol. 5  (1) , 41-48
• https://doi.org/10.1002/pat.1994.220050106

Abstract

Keywords

• RESIST
• LIGHOGRAPHY
• DRY DEVELOPMENT
• SILYLATION
• CHEMICAL AMPLIFICATION