Process dependence of roughness in a positive-tone chemically amplified resist
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6) , 3748-3751
- https://doi.org/10.1116/1.590401
Abstract
No abstract availableKeywords
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- A statistical analysis of ultraviolet, x-ray, and charged-particle lithographiesJournal of Vacuum Science & Technology B, 1986