Influence of temperature on the growth of TiN films by plasma-assisted chemical vapour deposition
- 1 July 1988
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 161, L87-L90
- https://doi.org/10.1016/0040-6090(88)90274-x
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- The relationship between hardness and scratch adhessionThin Solid Films, 1987
- TiN coatings on M2 steel produced by plasma-assisted chemical vapor depositionThin Solid Films, 1987
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Composition, morphology and mechanical properties of plasma-assisted chemically vapor-deposited TiN films on M2 tool steelThin Solid Films, 1986
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984