Properties of tantalum oxide thin films prepared by reactive sputtering.

• 1 January 1988
• journal article
• Published by The Vacuum Society of Japan in SHINKU
• Vol. 31  (11) , 922-928
• https://doi.org/10.3131/jvsj.31.922

Abstract

Keywords

• THIN FILMS
• PROPERTIES
• TANTALUM OXIDE
• REACTIVE SPUTTERING
• OXIDE THIN
• FILMS PREPARED