Ellipsometric investigation of thickness dependence of the optical constants of thin tungsten oxide films
- 1 August 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 203 (2) , 221-226
- https://doi.org/10.1016/0040-6090(91)90130-p
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Tungsten oxide films by reactive and conventional evaporation techniquesApplied Optics, 1989
- Variable angle of incidence spectroscopic ellipsometry: Application to GaAs-AlxGa1−xAs multiple heterostructuresJournal of Applied Physics, 1986
- Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eVPhysical Review B, 1983
- On the thermal oxidation kinetics of two metallic glassesCorrosion Science, 1982
- Ellipsometry in Thin Film AnalysisAnnual Review of Materials Science, 1981
- Application of ellipsometry to surface films and film growthSurface Technology, 1977
- Ellipsometry as an aid in studying metallic corrosion problemsSurface Science, 1976
- Thermal Regeneration of Oxide Covered Iron {100} and {110} SurfacesJournal of the Electrochemical Society, 1967
- Use of Ellipsometry in the Study off CorrosionCorrosion, 1966
- Room Temperature Oxidation of Iron at Low PressuresCorrosion, 1964