Multiwavelength ellipsometry for real-time process control of the plasma etching of patterned samples
- 1 January 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (1) , 109-115
- https://doi.org/10.1116/1.589234
Abstract
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