Oxidation kinetics of copper in the thin film range
- 31 August 1969
- journal article
- Published by Elsevier in Acta Metallurgica
- Vol. 17 (8) , 1009-1012
- https://doi.org/10.1016/0001-6160(69)90046-7
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Effect of Cold Working and Annealing on Oxidation Rates of Copper in Dry Air at Room TemperatureCorrosion, 1968
- Effect of an applied electric current on the rate of oxidation of copper at room temperatureActa Metallurgica, 1968
- Effect of minor amounts of lithium addition on the rate of oxidation of copper at room temperatureScripta Metallurgica, 1968
- Initial oxidation rate of metals and the logarithmic equationActa Metallurgica, 1956
- Oxide films on electrolytically polished copper surfacesTransactions of the Faraday Society, 1952
- The Copper Oxide RectifierReviews of Modern Physics, 1951
- Low Temperature Oxidation of Copper. II. Reaction Rate Anisotropy1Journal of the American Chemical Society, 1951
- Low Temperature Oxidation of Copper. I. Physical Mechanism1aJournal of the American Chemical Society, 1950
- Theory of the oxidation of metalsReports on Progress in Physics, 1949
- The Oxidation of MetalsTransactions of The Electrochemical Society, 1947