Characteristics of the etching of undoped silica in MCVD-fabricated optical fibers with buffered hydrofluoric acid
- 1 November 1985
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 20 (11) , 1367-1372
- https://doi.org/10.1016/0025-5408(85)90131-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- An overview of the modified chemical vapor deposition (MCVD) process and performanceIEEE Journal of Quantum Electronics, 1982
- Etch Rates of Doped Oxides in Solutions of Buffered HFJournal of the Electrochemical Society, 1973
- A Study of the Dissolution of SiO[sub 2] in Acidic Fluoride SolutionsJournal of the Electrochemical Society, 1971