The Influence of Surface Structure on the Photoelectrochemistry of Polycrystalline n-TiO2-Films

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Abstract
The relationship between the surface structure, film thickness and the photoelectrochemical behaviour (photocurrent, corrosion and stability) of n-Ti02-films produced by controlled thermal oxidation of titanium foils is carefully investigated. X-ray surveys, optical and scanning electron microscopical observations were performed to elucidate the surface structure. It is established that a special etching procedure of Ti-metal foils, followed by controlled oxidation at 600 to 700 °C for 10 to 30 min in the presence of sufficient oxygen results in n-Ti02 layers with a defined surface structure and high photoactivity. As charge transfer through the Schottky barrier is decisive for the photoefficiency, the formation kinetics of the oxide layer is the most influencing factor.

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