Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography
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- 10 December 2002
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Selected Topics in Quantum Electronics
- Vol. 8 (4) , 928-934
- https://doi.org/10.1109/jstqe.2002.800845
Abstract
We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV) lithography. We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimental results. Finally, we present some of the issues that arise when trying to use established complementary metal-oxide-semiconductor processes for the fabrication of photonic integrated circuits.Keywords
This publication has 13 references indexed in Scilit:
- High-NA ArF lithography for 70-nm technologiesPublished by SPIE-Intl Soc Optical Eng ,2002
- Out-of-plane scattering in photonic crystal slabsIEEE Photonics Technology Letters, 2001
- Design and fabrication of silicon photonic crystal optical waveguidesJournal of Lightwave Technology, 2000
- Demonstration of highly efficient waveguiding in a photonic crystal slab at the 15-µm wavelengthOptics Letters, 2000
- Optical and confinement properties of two-dimensional photonic crystalsJournal of Lightwave Technology, 1999
- Superprism phenomena in photonic crystals: toward microscale lightwave circuitsJournal of Lightwave Technology, 1999
- Guided modes in photonic crystal slabsPhysical Review B, 1999
- Two-dimensional photonic-bandgap structures operating at near-infrared wavelengthsNature, 1996
- Buried-oxide silicon-on-insulator structures. II. Waveguide grating couplersIEEE Journal of Quantum Electronics, 1992
- Low loss singlemode optical waveguides with large cross-section in silicon-on-insulatorElectronics Letters, 1991