Studies of copper deposition for high aspect ratio printed circuit boards
- 1 January 1989
- journal article
- research article
- Published by Taylor & Francis in Transactions of the IMF
- Vol. 67 (1) , 57-62
- https://doi.org/10.1080/00202967.1989.11870841
Abstract
The effects of temperature, current density, electrolyte composition and additive content on the electrodeposition of copper from acidic sulphate solutions have been investigated. Wagner numbers (Wa) were calculated from fundamental electrochemical studies at a rotating disc electrode. These were used to predict the throwing power of the system and to optimise plating conditions. Correlation betwen plating tests carried out on boards of 8:7 aspect ratio and fundamental results was excellent. Current density and solution conductivity were found to be the major influences on deposit uniformity and optimum conditions to obtain a 1:1 surface to hole ratio were established.Keywords
This publication has 15 references indexed in Scilit:
- Some mechanisms of action of additives in electrodeposition processesSurface and Coatings Technology, 1987
- Adsorption Behavior of Polyoxyethyleneglycole on the Copper Surface in an Acid Copper Sulfate BathDenki Kagaku oyobi Kogyo Butsuri Kagaku, 1984
- Mechanism of the Electrodeposition and Dissolution of Copper in an Acid Copper Sulfate Bath I. The Behavior of Intermediate, Cu+Denki Kagaku oyobi Kogyo Butsuri Kagaku, 1983
- The levelling mechanism during bright acid copper platingSurface Technology, 1982
- Investigation of Agitation Effects on Electroplated Copper in Multilayer Board Plated‐Through Holes in a Forced‐Flow Plating CellJournal of the Electrochemical Society, 1978
- Statistical Analysis of Electrode Kinetics Measurements‐Copper Deposition from CuSO4 ‐ H 2 SO 4 SolutionsJournal of the Electrochemical Society, 1977
- Electrode Kinetic Parameters for Copper Deposition on Clean and Soiled Copper CathodesJournal of the Electrochemical Society, 1963
- The Dependence of Charge Transfer and Surface Diffusion Rates on the Structure and Stability of an Electrode Surface: CopperJournal of the Electrochemical Society, 1962
- The Effect of Some Addition Agents on the Kinetics of Copper Electrodeposition from a Sulfate SolutionJournal of the Electrochemical Society, 1962
- Galvanostatic studies of the kinetics of deposition and dissolution in the copper + copper sulphate systemTransactions of the Faraday Society, 1959