Room-temperature deposition of Al-doped ZnO films by oxygen radical-assisted pulsed laser deposition
- 10 December 2002
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 422 (1-2) , 176-179
- https://doi.org/10.1016/s0040-6090(02)00965-3
Abstract
No abstract availableKeywords
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