Formation of 20–25Å Thermal Oxide Films on Silicon at 950°–1140°C

• 1 January 1971
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 118  (8) , 1370
• https://doi.org/10.1149/1.2408325

Abstract

Keywords

• 25A
• FORMATION
• THERMAL OXIDE FILMS
• FILMS ON SILICON