Plasma-enhanced chemical vapor deposition of silicon nitride from 1,1,3,3,5,5-hexamethylcyclotrisilazane and ammonia
- 1 October 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 153 (1-3) , 521-529
- https://doi.org/10.1016/0040-6090(87)90211-2
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
- Plasma assisted chemical vapor deposited thin films for microelectronic applicationsJournal of Vacuum Science & Technology B, 1986
- Aging Process in Plasma-Polymerized Organosilicon Thin FilmsJournal of Macromolecular Science: Part A - Chemistry, 1985
- Advances in basic and applied aspects of microwave plasma polymerizationThin Solid Films, 1984
- Electrical properties of plasma-polymerized thin organic filmsPlasma Chemistry and Plasma Processing, 1983
- Biomedical applications of plasma polymerization and plasma treatment of polymer surfacesBiomaterials, 1982
- Polymerization of Organosilicones in Microwave Discharges. II. Heated SubstratesJournal of Macromolecular Science: Part A - Chemistry, 1981
- Thermal Modification of Plasma-Polymerized Organosilazane Thin FilmsPublished by American Chemical Society (ACS) ,1979
- Effect of Glow Discharge Conditions on Structure and Thermal Properties of Polysilazane Thin FilmsJournal of Macromolecular Science: Part A - Chemistry, 1978
- Electrical properties of metal-polymer (polysiloxane)-silicon structures and application of polysiloxane to the passivation of semiconductor devicesThin Solid Films, 1976
- Thin Organosilicon Films for Integrated OpticsApplied Optics, 1972