Amorphous BN films produced in a double-plasma reactor for semiconductor applications
- 31 October 1983
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 26 (10) , 931-939
- https://doi.org/10.1016/0038-1101(83)90069-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Low Temperature Double‐Plasma Process for BN Films on SemiconductorsJournal of the Electrochemical Society, 1982
- Properties of BN films produced by a low-temperature double-plasma processJournal of Physics D: Applied Physics, 1982
- The Chemical Deposition of Boron‐Nitrogen FilmsJournal of the Electrochemical Society, 1980
- Conduction in thin dielectric filmsJournal of Physics D: Applied Physics, 1971