Microwave plasma apparatus for deposition of hydrogenated amorphous carbon layers
- 7 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 140, 784-787
- https://doi.org/10.1016/0921-5093(91)90514-n
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Preparation of amorphous i-C films by ion-assisted methodsThin Solid Films, 1989
- A chromium carbide phase with B1 structure in thin films prepared by ion platingThin Solid Films, 1988