Suppression by Pre-Diffusion Annealing of Anomalous Diffusion of B and P in Si Directly Masked with Si3N4 Films
- 1 September 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (9)
- https://doi.org/10.1143/jjap.20.1749
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Heat-treatment behavior of microdefects and residual impurities in CZ silicon crystalsJournal of Applied Physics, 1979