Adsorption of gas phase methyl radicals on the oxygen modified Mo(100) single crystal surface

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Abstract
The interaction of gas phase methyl radicals, •CH3, with a well characterized surface in ultrahigh vacuum has been studied for the first time. Methyl radicals were produced by low pressure thermal decomposition of azomethane flowing through a hot alumina tube. The sticking coefficient and surface reactions of •CH3interacting with a Mo(100) surface covered by one monolayer of atomic oxygen have been investigated using temperature programmed desorption and x‐ray photoelectron spectroscopy. The sticking coefficient of •CH3 on this surface is remarkably low, ∼2×10−3. This implies there exists a barrier to adsorption associated with either the energy necessary to distort the molecule from planar to tetrahedral geometry or possibly a restriction imposed by electron spin conservation. •CH3 reacts on the surface to form methane and hydrogen. Residual carbon eventually combines with the surface oxygen present to form carbon monoxide.

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