Electric-Field-Induced Soft-Mode Hardening inFilms
- 15 May 2000
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 84 (20) , 4625-4628
- https://doi.org/10.1103/physrevlett.84.4625
Abstract
We have studied electric-field-induced Raman scattering in thin films using an structure grown by pulsed laser deposition. The soft mode polarized along the field becomes Raman active. Experimental data for electric-field-induced hardening of the soft modes and the tuning of the static dielectric constant are in agreement described by the Lyddane-Sachs-Teller formalism. The markedly different behavior of the soft modes in thin films from that in the bulk is explained by the existence of local polar regions.
Keywords
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