Photoetching of narrow deep slots for stylus wear standards
- 1 October 1980
- journal article
- Published by Elsevier in Precision Engineering
- Vol. 2 (4) , 177-182
- https://doi.org/10.1016/0141-6359(80)90005-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Anisotropic etching of siliconIEEE Transactions on Electron Devices, 1978
- On etching very narrow grooves in siliconApplied Physics Letters, 1975
- Detection of Discontinuities in Passivating Layers on Silicon by NaOH Anisotropic EtchIBM Journal of Research and Development, 1972