Studies of Electron Attachment at Thermal Energies Using the Flowing Afterglow–Langmuir Probe Technique
- 1 January 1994
- book chapter
- Published by Elsevier
- Vol. 32, 307-343
- https://doi.org/10.1016/s1049-250x(08)60022-1
Abstract
No abstract availableThis publication has 59 references indexed in Scilit:
- Low-energy electron attachment to molecules studied by pulse-radiolysis microwave-cavity technique combined with microwave heatingThe Journal of Chemical Physics, 1992
- Gas-phase reactions of weak Broensted bases I-, PO3-, HSO4-, FSO3-, and CF3SO3- with strong Broensted acids H2SO4, FSO3H, and CF3SO3H. A quantitative intrinsic superacidity scale for the sulfonic acids XSO3H (X = HO, F, and CF3)Journal of the American Chemical Society, 1992
- Formation of Br−2 in the reactions of thermal electrons with some bromomethanes and bromoethanesInternational Journal of Mass Spectrometry and Ion Processes, 1990
- Studies of dissociative electron attachment to some haloethanes using the falp apparatus: comparisons with data obtained using non-thermal techniquesInternational Journal of Mass Spectrometry and Ion Processes, 1989
- Electron capture chemistry of CBrCl3 at atmospheric pressure by mass spectrometry and the photodetachment-modulated electron capture detectorInternational Journal of Mass Spectrometry and Ion Processes, 1989
- FALP studies of electron attachment reactions of C6F5Cl, C6F5Br and C6F5IInternational Journal of Mass Spectrometry and Ion Processes, 1989
- Studies of dissociative electron attachment to the free radicals CCl3 and CCl2Br using the FALP apparatusInternational Journal of Mass Spectrometry and Ion Processes, 1988
- Reaction rates of electrons with dipolar moleculesInternational Journal of Mass Spectrometry and Ion Processes, 1987
- Measurements of dissociative recombination coefficients of H+3, HCO+, N2H+, and CH+5 at 95 and 300 K using the FALP apparatusThe Journal of Chemical Physics, 1984
- Thermal Electron Attachment to SF6 and CFCl3Australian Journal of Physics, 1983