Ion Beam Etching of Silicon, Refractory Metals, and Refractory Metal Silicides Using a Chemistry Assisted Technique
- 1 February 1984
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 131 (2) , 375-380
- https://doi.org/10.1149/1.2115588
Abstract
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