Revisiting F 2 laser for DUV microlithography
- 26 July 1999
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- p. 541-546
- https://doi.org/10.1117/12.354365
Abstract
A molecular fluorine laser, specifically tailored for photolithography needs, was developed. Single line operation at 157.6nm was achieved by means of a prism assembly. Laser operation at repetition rates up to 1 kHz without signs of power saturation results in an average power of 15W. The energy stability was equal to comparable ArF laser. Proper choice of materials and corona pre-ionization enabled gas lifetimes in line with current ArF laser technology, without any need for cryogenic purification.Keywords
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