Selective Dissociative Ionization of SiH4, Si2H6 and Si3H8 by Electron Impact in Supersonic Free Jets
- 1 June 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (6B) , L879
- https://doi.org/10.1143/jjap.32.l879
Abstract
Low-energy (E=10-14 eV) electron-impact decomposition of SiH4, Si2H6, and Si3H8 into ionic species in a pulsed supersonic free jet has been investigated using quadrupole mass spectrometry. Si+ was the common primary dissociated product for E≤13 eV, while at E=14 eV, SiH2 + and SiH3 + became the primary species in the dissociation of SiH4 and Si2H6, respectively.Keywords
This publication has 17 references indexed in Scilit:
- Laser-assisted deposition of thin films from gas-phase and surface-adsorbed moleculesChemical Reviews, 1989
- Measurement of the SiH3 Radical Density in Silane Plasma using Infrared Diode Laser Absorption SpectroscopyJapanese Journal of Applied Physics, 1988
- Ground states and ionization energies of Si2H6, Si3H8, Si4H10, and Si5H12Journal of the American Chemical Society, 1988
- Dissociative photoionization of SiH4 in the 12–19 eV regionChemical Physics, 1987
- Theoretical thermochemistry. 2. Ionization energies and proton affinities of AHn species (A = C to F and Si to Cl); heats of formation of their cationsThe Journal of Physical Chemistry, 1987
- Photoionization mass spectrometry of silaneChemical Physics, 1986
- Quantitative photoexcitation study of SiH4 in vacuum ultravioletThe Journal of Chemical Physics, 1986
- The photoionization spectra of effusive and supersonic molecular beams of monosilaneThe Journal of Chemical Physics, 1985
- Photoelectron spectra and molecular properties. LI. Ionization potentials of silanes SinH2n+2Journal of the American Chemical Society, 1976
- Electron impact study of ionization and dissociation of monosilane and disilaneThe Journal of Physical Chemistry, 1969