Surface-plasmon excitation on oxide-covered spherical particles
- 15 September 1985
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 32 (6) , 4192-4200
- https://doi.org/10.1103/physrevb.32.4192
Abstract
We have investigated the inelastic scattering of fast electrons (50–100 keV) by oxide-covered spherical metallic particles, considering losses due to the excitation of bulk and surface plasmons. Whereas the electrons may be treated classically, the plasmons are described by a second-quantization formalism. After the establishment of the electron-plasmon interaction Hamiltonian, we derive the loss probability as a function of the electron impact parameter D. Numerical results are given for oxidized Al particles with inner radii a=105 and 255 Å covered by a 45-Å-thick layer described by a static dielectric function =3.73. As compared to oxide-free Al particles, the addition of an oxide layer not only produces a shift of the surface-plasmon frequencies, but also leads to a significant modification of the loss probability. Discussion of our results is made in comparison with experimental results of Batson and Treacy.
Keywords
This publication has 24 references indexed in Scilit:
- Physical adsorption and surface plasmonsProgress in Surface Science, 1983
- Observation of the image force for fast electrons near an MgO surfaceSolid State Communications, 1982
- Surface Plasmon Coupling in Clusters of Small SpheresPhysical Review Letters, 1982
- Surface energies and surface structure of small crystals studied by use of a stem instrumentSurface Science, 1982
- A new surface plasmon resonance in clusters of small aluminum spheresUltramicroscopy, 1982
- Damping of bulk plasmons in small aluminum spheresSolid State Communications, 1980
- Physical adsorption and surface plasmonsSurface Science, 1977
- Van der Waals energy between voids in dielectricsPhysical Review B, 1975
- Surface-Induced Dipole Moments of Adsorbed AtomsPhysical Review Letters, 1974
- Plasma Losses by Fast Electrons in Thin FilmsPhysical Review B, 1957