In situ study of electromigration by joule displacement microscopy
- 1 January 1985
- journal article
- Published by Institution of Engineering and Technology (IET) in IEE Proceedings I Solid State and Electron Devices
- Vol. 132 (1) , 9-12
- https://doi.org/10.1049/ip-i-1.1985.0003
Abstract
The applicability of a novel scheme—Joule displacement microscopy—to the characterisation of electromigration is demonstrated. It involves the detection of local changes to electric resistivity. The relative influence of four parameters which govern the electromigration process-current density, temperature, and their spatial divergences, are examined. It is shown that it is thereby possible to understand the differences in the impact of electromigration observed in films of aluminium and gold.Keywords
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