Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma

• 1 July 1995
• journal article
• Published by Trans Tech Publications, Ltd. in Solid State Phenomena
• Vol. 44-46, 181-194
• https://doi.org/10.4028/www.scientific.net/ssp.44-46.181

Abstract

Keywords

• ELECTRON DENSITY
• EXCITATION FREQUENCY
• GROWTH RATE
• ION FLUX
• VHF PLASMA DEPOSITION