Lithographic evaluation of a DUV carbon attenuated phase shift mask
- 31 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 107-110
- https://doi.org/10.1016/s0167-9317(98)00023-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Impact of lens aberrations on optical lithographyIBM Journal of Research and Development, 1997
- Lithographic evaluation of the hydrogenated amorphous carbon filmJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Optical properties of hydrogenated amorphous-carbon film for attenuated phase-shift mask applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993