Extendibility of x-ray lithography to ⩽130 nm ground rules in complex integrated circuit patterns
- 1 November 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 14 (6) , 4288-4293
- https://doi.org/10.1116/1.588592
Abstract
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