Large Area Laser-Assisted Etching of Electronic Materials
- 7 July 1986
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 0611, 62-69
- https://doi.org/10.1117/12.956412
Abstract
The use of laser assisted-chemistry for dry etching of electronic materials is described. Emphasis is placed on the use of laser-assisted reactions for large area processing. Review of the current technology is given for large area masked etching, UV-projection etching, and laser assisted reactive ion etching (RIE), and plasma etching.Keywords
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