In-situ ellipsometric characterization of the electrodeposition of metal films
- 1 December 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 270 (1-2) , 73-77
- https://doi.org/10.1016/0040-6090(95)06851-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ellipsometry in electrochemistry: a spectrum of applicationsThin Solid Films, 1993
- Analysis of Passive Film Growth by Dynamic Imaging MicroellipsometryJournal of the Electrochemical Society, 1992
- Microstructural evolution of ultrathin amorphous silicon films by real-time spectroscopic ellipsometryPhysical Review Letters, 1990
- Optical properties of thin filmsThin Solid Films, 1982