Laser-ablated carbon plasmas: emission spectroscopy and thin film growth
- 1 August 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 73 (3) , 170-176
- https://doi.org/10.1016/0257-8972(94)02380-8
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Laser-produced carbon plasma in an ambient gasPhysical Review E, 1993
- Fullerenes from laser produced plasmaPhysica Status Solidi (a), 1993
- Field Ion-Scanning Tunneling Microscopy Study of C60 on the Si(100) SurfaceJapanese Journal of Applied Physics, 1992
- Scanning Tunneling Microscopy of C60 on the Si(111)7×7 SurfaceJapanese Journal of Applied Physics, 1992
- Adsorption of individual Cmolecules on Si(111)Physical Review B, 1992
- Characterization of diamond films by Raman spectroscopyJournal of Materials Research, 1989
- Characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recordingJournal of Vacuum Science & Technology A, 1987
- Deposition of Diamond-like Carbon Films by Pulsed-Laser EvaporationJapanese Journal of Applied Physics, 1987
- Laser-wavelength dependence of mass-ablation rate and heat-flux inhibition in laser-produced plasmasPhysical Review A, 1982
- Franck-Condon factors based on RKR potentials with applications to radiative absorption coefficientsJournal of Quantitative Spectroscopy and Radiative Transfer, 1965