Subnanosecond Total-Light Decay and Spectra in-Si: H
- 9 May 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 50 (19) , 1490-1493
- https://doi.org/10.1103/physrevlett.50.1490
Abstract
With use of an ultrafast Ge photodiode and a high-power picosecond laser system, the fastest radiative processes in plasma-deposited -Si: H have been resolved. Spectrally integrated measurements on a 250-ps time scale provide a simple picture that for the first time isolates single rates in the recombination dynamics, permitting quantitative physical modeling. Spectral shifts are observed on time scales faster than the radiative decay, providing clear evidence of slow relaxation processes.
This publication has 14 references indexed in Scilit:
- Photoluminescence in a disordered insulator: The trapped-exciton modelPhysical Review B, 1982
- Model for the temperature dependence of photoluminescence in-Si:H and related materialsPhysical Review B, 1982
- Luminescence and recombination in hydrogenated amorphous siliconAdvances in Physics, 1981
- Measurement of the time evolution of the photoluminescence spectrum of-Physical Review B, 1981
- Above-band-gap emission in amorphous semiconductors: Localized states versus surface contaminationPhysical Review B, 1981
- The temperature dependence of photoluminescence in a-Si: H alloysSolid State Communications, 1980
- Time resolved photoluminescence near the “band gap” in amorphous siliconSolid State Communications, 1979
- Luminescence in amorphous semiconductorsAdvances in Physics, 1976
- Raman Spectra of Amorphous Si and Related Tetrahedrally Bonded SemiconductorsPhysical Review Letters, 1971
- The energy gap law for radiationless transitions in large moleculesMolecular Physics, 1970