Latent effects due to ESD in CMOS integrated circuits: review and experiments
- 1 January 1993
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Industry Applications
- Vol. 29 (1) , 88-97
- https://doi.org/10.1109/28.195893
Abstract
A review of the current information published on the subject of EOS/ESD latent failures is presented. In order to gain a better understanding of the phenomena involved in the input protection networks of CMOS integrated circuits, measurements were performed on both commercially available integrated circuits and a set of custom designed and fabricated devices. The tests investigated the effects of electrical stress, thermal shock, exposure to ultraviolet light, and thermal annealing. The results demonstrate the presence of latent failures in CMOS integrated circuits following exposure to ESD. The cumulative effect of repeated discharge can be partially alleviated using thermal annealing or exposure to light. A charge injection model is proposed to interpret the results.Keywords
This publication has 46 references indexed in Scilit:
- Effect of high-temperature anneal on interface states generation in stressed metal-oxide-semiconductor devicesApplied Physics Letters, 1991
- Nature of the defects generated by electric field stress at the Si-SiO2 interfaceApplied Physics Letters, 1991
- Interface and bulk trap generation in metal-oxide-semiconductor capacitorsJournal of Applied Physics, 1990
- Process Dependence of the Si ‐ SiO2 Interface Trap Density for Thin OxidesJournal of the Electrochemical Society, 1987
- Charge generation in thin SiO2 polysilicon-gate MOS capacitorsSolid-State Electronics, 1987
- On dielectric breakdown in oxidized siliconJournal of Vacuum Science & Technology A, 1987
- Dynamic Imaging of Current Conduction in Dielectric Films by Emission Microscopy8th Reliability Physics Symposium, 1987
- Time Resolved Annealing of Interface Traps in Polysilicon Gate Metal‐Oxide‐Silicon CapacitorsJournal of the Electrochemical Society, 1987
- Input ESD Protection Networks for Fineline NMOS - Effects of Stressing Waveform and Circuit Layout8th Reliability Physics Symposium, 1986
- Process‐Induced Interface and Bulk States in MOS StructuresJournal of the Electrochemical Society, 1985