Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography
- 1 August 2000
- journal article
- research article
- Published by Wiley in Advanced Materials
- Vol. 12 (15) , 1118-1122
- https://doi.org/10.1002/1521-4095(200008)12:15<1118::aid-adma1118>3.0.co;2-i
Abstract
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