Surface reaction of CF2 radicals for fluorocarbon film formation in SiO2/Si selective etching process
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (1) , 233-238
- https://doi.org/10.1116/1.580977
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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