Accurate determination of activation enthalpies associated with the stress-induced migration of Oxygen or Nitrogen in Tantalum and Niobium
- 30 June 1981
- journal article
- Published by Elsevier in Acta Metallurgica
- Vol. 29 (6) , 1047-1054
- https://doi.org/10.1016/0001-6160(81)90056-0
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Internal friction study on the existence of oxygen pairs in interstitial solid solution of tantalum with oxygenActa Metallurgica, 1981
- Oxygen and nitrogen diffusion in tantalumScripta Metallurgica, 1978
- Computer optimization of elastic after-effect curves: Niobium relaxation from room temperature to 114 CScripta Metallurgica, 1977
- On the calculations of the diffusion coefficients of oxygen and nitrogen in niobiumMetallurgical Transactions A, 1977
- Diffusion of Interstitial Solutes in the Group V Transition MetalsJournal of Applied Physics, 1959
- Internal Friction and Precipitation from the Solid Solution of N in TantalumPhysical Review B, 1948
- Stress Relaxation by Interstitial Atomic Diffusion in TantalumPhysical Review B, 1948