Comment on ``Dispersion Mechanisms of the MOS Impedance''
- 1 February 1969
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 40 (2) , 899
- https://doi.org/10.1063/1.1657487
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Dispersion Mechanisms of the MOS ImpedanceJournal of Applied Physics, 1968
- The Si-SiO2Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance TechniqueBell System Technical Journal, 1967