High-resolution pattern replication using soft X rays
- 24 February 1972
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 8 (4) , 102-104
- https://doi.org/10.1049/el:19720074
Abstract
A soft X ray lithographic technique capable of contactless replication of submicrometre linewidth planar-device patterns is described. Special soft X ray exposure masks have been developed for the 4–14 Å wavelength region. Elastic-surface-wave-transducer patterns with 1.3 μm electrode spacings were fabricated onto such masks using electron-beam techniques, and were successfully replicated.Keywords
This publication has 1 reference indexed in Scilit:
- The Efficiency of Production of Characteristic X RadiationPublished by Elsevier ,1963