Molecular model of phenolic polymer dissolution in photolithography
- 19 July 1999
- journal article
- research article
- Published by Wiley in Journal of Polymer Science Part B: Polymer Physics
- Vol. 37 (16) , 2103-2113
- https://doi.org/10.1002/(sici)1099-0488(19990815)37:16<2103::aid-polb13>3.0.co;2-5
Abstract
No abstract availableKeywords
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- Percolation View of Novolak Dissolution. 10. Effect of Resin Molecular WeightMacromolecules, 1998
- The Mechanism of Phenolic Polymer Dissolution: A New PerspectiveMacromolecules, 1997
- Diazonaphthoquinone-based ResistsPublished by SPIE-Intl Soc Optical Eng ,1993
- Reduction in x-ray lithography shot noise exposure limit by dissolution phenomenaJournal of Vacuum Science & Technology B, 1988