An investigation on p—n junction etch stop
- 1 February 1993
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 35 (3) , 181-187
- https://doi.org/10.1016/0924-4247(93)80149-b
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Ellipsometric Study of Orientation‐Dependent Etching of Silicon in Aqueous KOHJournal of the Electrochemical Society, 1985
- Bias‐Dependent Etching of Silicon in Aqueous KOHJournal of the Electrochemical Society, 1985
- Ellipsometric Study of the Etch‐Stop Mechanism in Heavily Doped SiliconJournal of the Electrochemical Society, 1985
- Study of the Orientation Dependent Etching and Initial Anodization of Si in Aqueous KOHJournal of the Electrochemical Society, 1983
- Study of the Etch‐Stop Mechanism in SiliconJournal of the Electrochemical Society, 1982