Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and X-ray photoelectron spectroscopy
- 1 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 648-664
- https://doi.org/10.1016/0040-6090(90)90216-z
Abstract
No abstract availableKeywords
This publication has 51 references indexed in Scilit:
- Oxidation of metastable single-phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanismsJournal of Applied Physics, 1990
- Selective oxidation and chemical state of Al and Ti in (Ti, Al)n coatingsSurface and Interface Analysis, 1988
- An AES study of the oxidation of polycrystalline zirconium at room temperature and low oxygen pressuresSurface and Interface Analysis, 1987
- Quantitative AES depth profiling of very thin overlayersSurface and Interface Analysis, 1986
- Practical surface analysis: state of the art and recent developments in AES, XPS, ISS and SIMSSurface and Interface Analysis, 1986
- International Workshop on ?Critical Issues Concerning the Mechanisms of High-Temperature Corrosion?Oxidation of Metals, 1985
- An XPS comparative study on thermal oxide barrier formation on Nb and NbN thin filmsApplications of Surface Science, 1985
- Calibration of argon ion sputter rates using nuclear microanalysis and Auger spectroscopySurface and Interface Analysis, 1985
- Thermal Oxidation of Niobium Nitride Films at Temperatures from 20°–400°C: I . The Surface ReactionJournal of the Electrochemical Society, 1983
- Auger electron spectroscopy and X-ray photoelectron spectroscopy studies of the oxidation of polycrystalline tantalum and niobium at room temperature and low oxygen pressuresJournal of the Less Common Metals, 1983