Phenomena produced by ion bombardment in plasma-assisted etching environments
- 1 May 1988
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 6 (3) , 1997-2000
- https://doi.org/10.1116/1.575225
Abstract
The emphasis of this review paper will be to summarize recent experimental results, describe and evaluate contemporary concepts in the etching field, and to provide references to recent work.Keywords
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