Plasma etching for micromechanical sensor applications
- 31 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 365-368
- https://doi.org/10.1016/0167-9317(94)90174-0
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Chlorine or bromine chemistry in reactive ion etching Si-trench etchingPublished by SPIE-Intl Soc Optical Eng ,1991
- Fabrication of Non‐Underetched Convex Corners in Anisotropic Etching of (100)‐Silicon in Aqueous KOH with Respect to Novel Micromechanic ElementsJournal of the Electrochemical Society, 1990
- Fabrication of 15 μm thick Si-hole masks for demagnifying projection systems for ion- or electron-beamsMicroelectronic Engineering, 1987