The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry
- 22 November 1999
- journal article
- letter
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 111 (20) , 9125-9128
- https://doi.org/10.1063/1.479386
Abstract
The site-specific rates of isopropanol reaction on Si(111) were studied by kinetic competition with an etchant of known anisotropy and quantified using concentration-dependent changes in the etched surface morphology using a combination of STM measurements and kinetic Monte Carlo simulations. The isopropoxide ion was identified as the active species.Keywords
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