Synchrotron radiation assisted deposition of carbon films
- 16 October 1989
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (16) , 1644-1646
- https://doi.org/10.1063/1.102225
Abstract
Photochemical vapor deposition of carbon films from n-butane gas has been successfully done, for the first time, at room temperature using synchrotron radiation as a light source. The deposited films are hydrogenated amorphous carbon films with sp3 bonds. The deposition rate increases with negative bias.Keywords
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