The design philosophy for a 200 kV industrial high current ion implanter

• 15 December 1976
• journal article
• Published by Elsevier in Nuclear Instruments and Methods
• Vol. 139, 125-134
• https://doi.org/10.1016/0029-554x(76)90667-4

Abstract

Keywords

• FIBRE OPTICS
• HEAT DISSIPATION
• SURFACES WITH TEMPERATURES
• LIQUID NITROGEN
• SILICON WAFERS
• SPACE CHARGE
• CURRENT ION IMPLANTER
• HIGH CURRENT ION
• INDUSTRIAL HIGH CURRENT