Evidence for enhanced zinc interstitial concentration in strain-relaxed heteroepitaxial indium phosphide

Abstract
Heteroepitaxial InP films grown on GaAs substrates by metalorganic chemical vapor deposition are demonstrated to have a higher concentration of zinc occupying interstitial sites than do equivalent homoepitaxial InP layers. A zinc interstitial-related donor-to-acceptor photoluminescence peak is observed in heteroepitaxial InP films which is absent in the homoepitaxial sample spectra. Capacitance–voltage measurements yield a lower hole concentration in the heteroepitaxial layers versus the homoepitaxial layers, which is attributable to a higher fraction of zinc in interstitial sites within the heteroepitaxial layers. Additionally, the hole concentration of the heteroepitaxial layers is found to be lower near the heterojunction as compared with the film surface region, correlating with a higher dislocation density near the heterojunction as seen by transmission electron microscopy. We conclude that the increased zinc interstitial concentration and the reduced hole concentration are due to dislocation-zinc solute interactions.

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