Morphology of germanium nanowires grown in presence of B2H6
- 23 January 2006
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 88 (4) , 043113
- https://doi.org/10.1063/1.2165089
Abstract
We study the Au-catalyzed chemical vapor growth of germanium (Ge) nanowires in the presence of di-borane , serving as doping precursor. Our experiments reveal that, while undoped Ge nanowires can be grown epitaxially on Si(111) substrates with very long wire lengths, the exposure renders the Ge nanowires significantly tapered. As we describe here, this peculiar morphology stems from the combination of the acicular, one-dimensional nanowire growth and a dramatically enhanced, B-induced conformal Ge deposition. The combination of acicular and conformal Ge growth mechanisms results in cone-shaped Ge nanostructures.
Keywords
This publication has 15 references indexed in Scilit:
- Nanopillar growth mode by vapor-liquid-solid epitaxyApplied Physics Letters, 2004
- Growth and Structure of Chemically Vapor Deposited Ge Nanowires on Si SubstratesNano Letters, 2004
- High Performance Silicon Nanowire Field Effect TransistorsNano Letters, 2003
- Low‐Temperature Synthesis of Single‐Crystal Germanium Nanowires by Chemical Vapor DepositionAngewandte Chemie International Edition in English, 2002
- Size-, shape-, and position-controlled GaAs nano-whiskersApplied Physics Letters, 2001
- Direct Observation of Vapor−Liquid−Solid Nanowire GrowthJournal of the American Chemical Society, 2001
- Functional Nanoscale Electronic Devices Assembled Using Silicon Nanowire Building BlocksScience, 2001
- Growth and Characterization of Polycrystalline SiliconJournal of the Electrochemical Society, 1973
- Low Temperature Chemical Vapor Deposition of Boron Doped Silicon FilmsJournal of the Electrochemical Society, 1973
- Relation Between Surface Concentration and Average Conductivity in Diffused Layers in GermaniumBell System Technical Journal, 1961